@terry9
First the R/ = shorthand for Respectfully, and I noted an error in post - meant to "... the stylus does contact..."
In precision cleaning, the industry standard for water is ASTM-D1193. Once we get past tap-water, ASTM-D1193 has essentially 3 classes of water, Purified (Type 4), Pure (Type 2) and Ultra-Pure (Type 1) and theses are generally specified by resistivity - ohms (or its inverse - conductivity). You can get on the web and find TDS to resistivity conversion charts, but 30 ppm TDS is equal to about 20K-ohms. Definitely way better than 200-ppm tap-water, but this is how it compares:
-Purified Water (single step distilled, demineralized, RO) = >200K-ohms
-Pure Water (two step distilled & demineralized) = >1,000K-ohms (1M-ohm)
-Ultra-Pure Water (generally about 3-steps) = >18,000K-ohms (18M-ohms)
30 ppm water that is about 20K-ohm is fine for cleaning, but is a bit short for the final polish. The purer the water, the more aggressive it becomes believe it or not, and of course the less residue. Ultra-Pure water is used to clean semi-conductor chips, but it can takes weeks for the applicable system to clean themselves to the point that they are clean (i.e. system commissioned), and has no application here. Even Pure Water is a stretch, but Purified Water for the final touch/polish should be the goal.
That being said, in the past (now retired) I have approved Navy cleaning procedures where the final polish was only 50K-ohm, and it was acceptable, but the particulate cleanliness was not critical, anything less than visual was not a problem. But very small particulate and salts/mineral residue is an issue here, so, my recommendation for the final polish would be Purified Water (distilled or demineralized) to get the best results.
R/Neil
First the R/ = shorthand for Respectfully, and I noted an error in post - meant to "... the stylus does contact..."
In precision cleaning, the industry standard for water is ASTM-D1193. Once we get past tap-water, ASTM-D1193 has essentially 3 classes of water, Purified (Type 4), Pure (Type 2) and Ultra-Pure (Type 1) and theses are generally specified by resistivity - ohms (or its inverse - conductivity). You can get on the web and find TDS to resistivity conversion charts, but 30 ppm TDS is equal to about 20K-ohms. Definitely way better than 200-ppm tap-water, but this is how it compares:
-Purified Water (single step distilled, demineralized, RO) = >200K-ohms
-Pure Water (two step distilled & demineralized) = >1,000K-ohms (1M-ohm)
-Ultra-Pure Water (generally about 3-steps) = >18,000K-ohms (18M-ohms)
30 ppm water that is about 20K-ohm is fine for cleaning, but is a bit short for the final polish. The purer the water, the more aggressive it becomes believe it or not, and of course the less residue. Ultra-Pure water is used to clean semi-conductor chips, but it can takes weeks for the applicable system to clean themselves to the point that they are clean (i.e. system commissioned), and has no application here. Even Pure Water is a stretch, but Purified Water for the final touch/polish should be the goal.
That being said, in the past (now retired) I have approved Navy cleaning procedures where the final polish was only 50K-ohm, and it was acceptable, but the particulate cleanliness was not critical, anything less than visual was not a problem. But very small particulate and salts/mineral residue is an issue here, so, my recommendation for the final polish would be Purified Water (distilled or demineralized) to get the best results.
R/Neil